Photoacoustic spectrum and surface morphology of porous silicon

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 5 SUPPL. B, 1998, Pages 2823-2826

  Kawahara, Toshio ^a   Mihara, Michiyo ^a   Morimoto, Jun ^a   Miyakawa, Toru ^b  

^a NATIONAL DEFENSE ACADEMY   (Japan)

^b CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

AFM; PAS; Photoacoustic spectroscopy; Photoluminescence spectroscopy; PL; Porous Si; Scanning probe microscopy; Si; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; MORPHOLOGY; PHOTOACOUSTIC EFFECT; PHOTOACOUSTIC SPECTROSCOPY; PHOTOLUMINESCENCE; POROSITY; SURFACES;

PHOTOLUMINESCENCE SPECTROSCOPY; POROSITY DEPENDENCE; SCANNING PROBE MICROSCOPY;

POROUS SILICON;

EID: 0032068340     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2823     Document Type: Article

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