Application of cross-sectional transmission electron microscopy to thin-film-transistor failure analysis

IBM Journal of Research and Development

Volumn 42, Issue 3-4, 1998, Pages 509-515

  Tsuji, S ^a   Tsujimoto, K ^a   Iwama, H ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTAL DEFECTS; CRYSTAL WHISKERS; ETCHING; FAILURE ANALYSIS; ION BEAMS; MULTILAYERS; THIN FILM TRANSISTORS; TRANSMISSION ELECTRON MICROSCOPY;

ACTIVE MATRIX LIQUID CRYSTAL DISPLAYS (AMLCD); CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (X TEM); FOCUSED ION BEAM (FIB) TECHNIQUES;

LIQUID CRYSTAL DISPLAYS;

EID: 0032066922     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.423.0509     Document Type: Article

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