Cross-sectional TEM sample preparation method using FIB etching for thin-film transistor

Materials Research Society Symposium - Proceedings

Volumn 480, Issue , 1997, Pages 207-215

  Tsujimoto, K ^a   Tsuji, S ^a   Takatsuji, H ^a   Kuroda, K ^a   Saka, H ^a   Miura, N ^a  

^a ITES Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CRYSTAL WHISKERS; DEPOSITION; ETCHING; GALLIUM; GLASS; ION BEAMS; METALLIZING; SEMICONDUCTOR DEVICE MANUFACTURE; SPECIMEN PREPARATION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (XTEM); FOCUSED ION BEAM (FIB) ETCHING;

THIN FILM TRANSISTORS;

EID: 0031373660     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-480-207     Document Type: Conference Paper

References (21)