Comparison of resolution between lens projection optical and X-ray proximity lithographies

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 5 A, 1998, Pages 2742-2746

  Horiuchi, Toshiyuki ^a  

^a TOKYO DENKI UNIVERSITY   (Japan)

Author keywords

Image intensity curve; Lens projection; Optical lithography; Resolution; X ray lithography; X ray proximity printing

Indexed keywords

CALCULATIONS; OPTICAL RESOLVING POWER; TECHNOLOGY; X RAY LITHOGRAPHY;

IMAGE INTENSITY CURSE; LENS PROJECTION;

PHOTOLITHOGRAPHY;

EID: 0032065767     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2742     Document Type: Article

References (16)

1. T. Tsuruta: Oyo Kogaku (Applied Optics) (Baifuukan, Tokyo, 1990) p. 176 [in Japanese].
2. H. Kubota: Hado Kogaku (Wave Motion Optics) (Iwanami, Tokyo, 1971) p. 289 [in Japanese].
3. S. Moriguchi, Y. Udagawa and S. Ichimatsu: Sugaku Koshiki II (Mathematical Formulas II) (Iwanami, Tokyo, 1957) pp. viii and xii [in Japanese].
4. M. D. Levenson, N. S. Viswanathan and R. A. Simpson: IEEE Trans. Electron Devices 29 (1982) 1828.
5. H. Jinbo and Y. Yamashita: Tech. Dig. IEDM 90 (1990) p. 817.
6. S. Matsuo, K. Komatsu, Y. Takeuchi, E. Tamechika, Y. Mimura and K. Harada: Tech. Dig. IEDM 91 (1991) p. 970.
7. H. Fukuda and R. Yamanaka: Jpn. J. Appl. Phys. 31 (1992) 4126.
8. M. Shibuya, M. Komatsu, T. Ozawa and H. Ooki: Jpn. J. Appl. Phys. 33 (1994) 6874.
9. Y. Kikuchi, H. Nomura, I. Higashikawa and Y. Gomei: Jpn. J. Appl. Phys. 33 (1994) 6928.
10. Y. Somemura, K. Deguchi and K. Miyoshi: Jpn. J. Appl. Phys. 33 (1994) 6389.
11. T. Ogawa, M. Uematsu, T. Onodera, K. Nakazawa, M. Takahashi, T. Ohfuji, H. Ohtsuka and M. Sasago: Dig. Pap. Microprocesses and Nanotechnology '97, p. 42.
12. K. Nakazawa, M. Uematsu, T. Onodera, , K. Kamon, T. Ogawa, S. Mori, M. Takahashi, T. Ohfuji, H. Ohtsuka and M. Sasago: Dig. Pap. Microprocesses and Nanotechnology '97, p. 60.
13. Y. Trouiller, N. Buffet, T. Mourier, P. Schiavone and Y. Quere: Book of Abstracts, MNE 97, OL II-2.
14. Deguchi, K. Miyoshi, M. Oda, T. Matsuda, A, Ozawa and H. Yoshihara: J. Vac. Sci. Technol. B 14 (1996) 4294.
15. Y. Chen, R. K. Kupka, F. Rousseaux, F. Carcenac, D. Decanini, M. F. Ravet and H. Launois: J. Vac. Sci. Technol. B 12 (1994) 3959.
16. M. Yamabe: Dig. Pap. Microprocesses and Nanotechnology '97, p. 34.