The passivation behavior of sputter-deposited W-Ta alloys in 12M HCl

Corrosion Science

Volumn 40, Issue 4-5, 1998, Pages 757-779

  Bhattarai, J ^a   Akiyama, E ^a   Habazaki, H ^a   Kawashima, A ^a   Asami, K ^a   Hashimoto, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC POLARIZATION; HYDROCHLORIC ACID; MAGNETRON SPUTTERING; SOLUTIONS; THALLIUM ALLOYS; TUNGSTEN ALLOYS; X RAY PHOTOELECTRON SPECTROSCOPY;

CONCENTRATED ACID SOLUTIONS; PASSIVE FILMS;

PASSIVATION;

HYDROCHLORIC ACID; PASSIVATION; TANTALUM; TUNGSTEN;

EID: 0032051512     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0010-938X(97)00177-7     Document Type: Article

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