The corrosion behavior of sputter-deposited Mo-Ta alloys in 12 M HCl solution

Corrosion Science

Volumn 38, Issue 3, 1996, Pages 397-411

  Park, P Y ^a   Akiyama, E ^a   Kawashima, A ^a   Asami, K ^a   Hashimoto, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

A. alloy; A. sputtered films; B. XPS; C. passive films

Indexed keywords

ALLOYS; CORROSION; MOLYBDENUM & TANTALUM; SPUTTERING;

COMPOSITION EFFECTS; CORROSION; CORROSION RESISTANCE; ELECTROCHEMISTRY; HYDROCHLORIC ACID; METALLIC FILMS; PASSIVATION; SOLID SOLUTIONS; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

MOLYBDENUM TANTALUM ALLOYS; SPONTANEOUSLY PASSIVE FILMS;

MOLYBDENUM ALLOYS;

EID: 0030088392     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0010-938X(96)00134-5     Document Type: Article

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