Transmission electron microscopy of thin-film transistors on glass substrates

Thin Solid Films

Volumn 319, Issue 1-2, 1998, Pages 106-109

  Tsujimoto, Katsuhiro ^a   Tsuji, Satoshi ^a   Kuroda, Kotaro ^b   Saka, Hiroyasu ^b  

^a IBM JAPAN LTD   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Focused ion beam; Glass substrates; Transmission electron microscopy

Indexed keywords

ETCHING; GLASS; ION BEAMS; SPECIMEN PREPARATION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (X TEM); FOCUSED ION BEAMS (FIB);

THIN FILM TRANSISTORS;

EID: 0032049419     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01096-1     Document Type: Article

References (15)

1. A.V. Gelatos, J. Kanicki, Appl. Phys. Lett. 56 (1990) 940.
2. C.R.M. Grovenor, Microelectronic Materials, Institute of Physics, Oxford, 1992, p. 67.
3. E.C.G. Kirk, D.A. Williams, H. Ahmed, Inst. Phys. Conf. Ser. 100 (1989) 501.
4. N. Nikawa, J. Vac. Sci. Technol. B 9 (1991) 2556.
5. S. Morris, S. Tatti, N. Dickson, H. Mendez, B. Schwiesow, R. Pyle, ISTFA 91 Dig., 1991, p. 417.
6. J. Szot, R. Hornsey, T. Ohnishi, S. Minagawa, J. Vac. Sci. Technol. B 10 (1992) 575.
7. M. Tarutani, Y. Takai, R. Shimizu, Jpn. J. Appl. Phys. 31 (1992) 1306.
8. A. Yamaguchi, M. Shibata, T. Hashinaga, J. Vac. Sci. Technol. B 11 (1993) 2016.
9. Y. Yabuuchi, Extended abstracts, 9th Meeting of Analytical Electron Microscopy, 1993, p. 44.
10. R. Pantel, G. Auvert, G. Mascarin, J.P. Gonchond, ICEM 13 (1994) 1007.
11. H. Saka, K. Kuroda, M.H. Hong, T. Kamino, T. Yaguchi, H. Tsuboi, T. Ishitani, H. Koike, A. Shibuya, Y. Adachi, ICEM 13 (1994) 1009.
12. T. Ishitani, H. Tsuboi, T. Yaguchi, H. Koike, J. Electron Microsc. 43 (1994) 322.
13. A. Yamaguchi, T. Nishikawa, J. Vac. Sci. Technol. B 13 (1995) 962.
14. L.M. Gignac, T.M. Parrill, G.V. Chandrashekhar, Thin Solid Films 261 (1995) 59.
15. S. Tsuji, K. Tsujimoto, N. Tsutsui, N. Miura, K. Kuroda, H. Saka, Thin Solid Films 281-282 (1996) 562.