Application of focused ion beam milling to cross-sectional TEM specimen preparation of industrial materials including heterointerfaces

Thin Solid Films

Volumn 319, Issue 1-2, 1998, Pages 92-96

  Kuroda, K ^a   Takahashi, M ^a   Kato, T ^a   Saka, H ^a   Tsuji, S ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b IBM JAPAN LTD   (Japan)

Author keywords

Diamond film; Focused ion beam (FIB); Galvanized steel; Thin film transistor (TFT); Transmission electron microscope (TEM)

Indexed keywords

DIAMOND FILMS; GALVANIZED METAL; INDUSTRIAL APPLICATIONS; INTERFACES (MATERIALS); ION BEAMS; SPECIMEN PREPARATION; STEEL; THIN FILM TRANSISTORS; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAM (FIB) MILLING; HETEROINTERFACES; INDUSTRIAL MATERIALS;

MATERIALS SCIENCE;

EID: 0032049418     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01093-6     Document Type: Article

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