Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis

Vide: Science, Technique et Applications

Volumn 53, Issue 283 SUPPL., 1997, Pages 169-172

  Kal, S ^a,c   Kasko, I ^a   Ryssel, H ^a,b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^c INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 20544468736     PISSN: 12660167     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. J.A. Kittl, Q.Z. Hong, R. Rodder, D.A. Prinslow, and G.R. Misium, VLSI Tech.Dig., 14 (1996)
2. K, Fujji, K. Kikuta, and T. Kikkawa, VLSI Tech.Dig., 57 (1995)
3. R. Schork, S. Krügel, C. Schneider, L. Pfitzner and H. Ryssel, Journal de Physique IV, 4,C7-27 (1994)
4. J.A. Dobrowolski et al, Applied Optics, 22, 3191 (1983)
5. A. Mandelis (ed), Photoacoustic and Thermal Wave Phenomena in Semiconductors, North-Holland, 1987