A model for the etch-stop location on reverse-biased pn junctions

Sensors and Actuators, A: Physical

Volumn 66, Issue 1-3, 1998, Pages 259-267

  Lapadatu, Daniel ^a,b   Kittilsland, Gjermund ^a,b   Nese, Martin ^a   Nilsen, Svein M ^a   Jakobsen, Henrik ^a  

^a SensoNor   (Norway)

^b Technology Development Department   (Norway)

Author keywords

Electrochemical etch stop; Etch stop location; Etch stop model

Indexed keywords

ELECTROCHEMICAL ELECTRODES; MATHEMATICAL MODELS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS; SUBSTRATES; THERMAL EFFECTS;

ELECTROCHEMICAL ETCH STOP; ETCH STOP LOCATION;

ETCHING;

EID: 0032047214     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01687-7     Document Type: Article

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