An investigation of the pulsed plasma for deposition of thin film materials

Surface and Coatings Technology

Volumn 102, Issue 1-2, 1998, Pages 175-181

  Yan, Pengxun ^a,b   Hui, Ping ^a   Zhu, Weiguang ^a   Tan, Hongsiang ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b LANZHOU UNIVERSITY   (China)

Author keywords

Pulsed plasma; Spectroscopy; Thin film

Indexed keywords

CARRIER CONCENTRATION; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRODES; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA GUNS; PLASMA INTERACTIONS; SPECTROSCOPIC ANALYSIS;

PULSED PLASMAS;

THIN FILMS;

EID: 0032046010     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00356-9     Document Type: Article

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