High power density pulsed plasma deposition of titanium carbonitride

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 1, 1996, Pages 115-117

  Yan, P X ^a   Yang, S Z ^a   Li, B ^a   Chen, X S ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030538518     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579905     Document Type: Article

References (10)

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6. D. J. Cheng, W. P. Sun, and M. H. Hon, Thin Solid Films 146, 45 (1987).
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8. P. X. Yan, S. Z. Yang, J. Yang, Q. Li, B. Li, C. Z. Liu, and X. S. Chen, Chin. Phys. Lett. 11, 558 (1994).
9. P. X. Yan, S. Z. Yang, B. Li, and X. S. Chen, J. Cryst. Growth 148, 232 (1995)
10. W. P. Sun, D. J. Cheng, and M. H. Hon, J. Cryst. Growth 71, 787 (1985).