Development of an ion and electron dual focused beam apparatus for three-dimensional microanalysis

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 4 SUPPL. A, 1998, Pages 2051-2056

  Sakamoto, Tetsuo ^b   Cheng, Zhaohui ^b   Takahashi, Masanori ^b   Owari, Masanori ^a   Nihei, Yoshimasa ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

3D analysis; Elemental mapping; Ga FIB; Microparticle; SAM

Indexed keywords

ELECTRON BEAMS; FOCUSING; IMAGING TECHNIQUES; ION BEAMS; MASS SPECTROMETRY;

FOCUSED ION BEAMS; MICROPARTICLES;

MICROANALYSIS;

EID: 0032045830     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2051     Document Type: Article

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