Atomic-scale mechanisms of the halogenation of Cu(100)

Surface Science

Volumn 401, Issue 2, 1998, Pages 173-184

  Nakakura, C Y ^a   Zheng, G ^a   Altman, E I ^a  

^a Yale University   (United States)

Author keywords

Bromine; Chemisorption; Chlorine; Copper; Etching; Halides; Halogens; Low energy electron diffraction (LEED); Low index single crystal surfaces; Models of surface kinetics; Oxidation; Scanning tunneling microscopy

Indexed keywords

ADSORPTION; BROMINE; CHEMISORPTION; CHLORINE; CRYSTAL ORIENTATION; ETCHING; HALOGENATION; MONTE CARLO METHODS; OXIDATION; RELAXATION PROCESSES; SINGLE CRYSTALS; SURFACE PHENOMENA;

ADATOMS; LOW INDEX SINGLE CRYSTALS;

COPPER;

EID: 0032045707     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)01034-0     Document Type: Article

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