Hot filament chemical vapor deposition diamond growth kinetics on an epitaxial CoSi2 surface monitored by three electron spectroscopies

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 2, 1998, Pages 494-501

  Arnault, J C ^a   Lang, B ^a   Le Normand, F ^a  

^a UMR 46   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBIDES; CHEMICAL VAPOR DEPOSITION; COBALT COMPOUNDS; DIAMOND FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; EPITAXIAL GROWTH; NUCLEATION; SILICON; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

COBALT SILICIDE; HOT FILAMENT CHEMICAL VAPOR DEPOSITION;

FILM GROWTH;

EID: 0032026816     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581049     Document Type: Article

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