High temperature epitaxial growth and structure of Nb films on α-Al2O3(0001)

Journal of Materials Research

Volumn 13, Issue 3, 1998, Pages 693-702

  Wagner, Thomas ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; MOLECULAR BEAM EPITAXY; MORPHOLOGY; NIOBIUM; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ISLAND GROWTH PROCESS; VOLMER-WEBER GROWTH MODE;

THIN FILMS;

EID: 0032025345     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.1998.0087     Document Type: Article

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