Thermal stability of Nb thin films on sapphire

Journal of Materials Research

Volumn 11, Issue 5, 1996, Pages 1255-1264

  Wagner, Thomas ^a   Lorenz, Marko ^a   Rühle, Manfred ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; EPITAXIAL GROWTH; FILM GROWTH; MOLECULAR BEAM EPITAXY; NIOBIUM; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SAPPHIRE; SUBSTRATES; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CONVENTIONAL TRANSMISSION ELECTRON MICROSCOPY; INTERFACIAL DEFECTS; POLYCRYSTALLINE THIN FILMS; SELECTED AREA DIFFRACTION;

THIN FILMS;

EID: 0030150315     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0160     Document Type: Article

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