Fabrication of a silicon-vacuum field-emission microdiode with a moving anode

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 665-669

  Bruschi, P ^a   Diligenti, A ^a   Iani, F ^a   Nannini, A ^a   Piotto, M ^a  

^a UNIVERSITY OF PISA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; CATHODES; CMOS INTEGRATED CIRCUITS; CURRENT VOLTAGE CHARACTERISTICS; ETCHING; MASKS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS;

ANODE TO CATHODE DISTANCE; VACUUM DIODE;

SCHOTTKY BARRIER DIODES;

EID: 0032023180     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589877     Document Type: Article

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