Photochemical vapour deposition of hydrogenated amorphous silicon-carbon thin films by using a Xe 2 * excimer lamp

Applied Surface Science

Volumn 106, Issue , 1996, Pages 55-59

  Redondas, X ^a   Gonzalez P ^a   Chiussi, S ^a   Parada, E G ^a   Pou, J ^a   Leon B ^a   Perez Amor M ^a  

^a UNIVERSITY OF VIGO   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ELLIPSOMETRY; EXCIMER LASERS; INFRARED SPECTROSCOPY; LASER BEAM EFFECTS; PHOTOCHEMICAL REACTIONS; PHOTONS; PRESSURE EFFECTS; SUBSTRATES; THIN FILMS; VAPOR PRESSURE;

EXCIMER LAMP; PHOTOCHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

EID: 0030565894     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00377-7     Document Type: Article

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