메뉴 건너뛰기




Volumn 42, Issue 3, 1998, Pages 447-451

Reverse currents of Schottky gates of III-V MESFET/HEMTs: Field emission and tunnel currents

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; ELECTRON TUNNELING; HIGH ELECTRON MOBILITY TRANSISTORS; MESFET DEVICES; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING INDIUM GALLIUM ARSENIDE;

EID: 0032017405     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(97)00264-5     Document Type: Article
Times cited : (17)

References (5)
  • 1
    • 0348010423 scopus 로고
    • Limitation in downsizing of silicon devices and their performance
    • Iwai, H. and Momose, H., Limitation in downsizing of silicon devices and their performance, Oyo Butsuri, 1995, 64(11), 1074-1084.
    • (1995) Oyo Butsuri , vol.64 , Issue.11 , pp. 1074-1084
    • Iwai, H.1    Momose, H.2
  • 4
  • 5
    • 85033930163 scopus 로고    scopus 로고
    • Fabrication and characterization of insulated gate InGaAs HEMT using Si interface control layer
    • x995-10
    • Suzuki, S. Doumae Y. and Hasegawa, H. Fabrication and characterization of insulated gate InGaAs HEMT using Si interface control layer, Technical Report of IEICE, ED-95, x995-10, pp. 21-28.
    • Technical Report of IEICE, ED-95 , pp. 21-28
    • Suzuki, S.1    Doumae, Y.2    Hasegawa, H.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.