Influence of roughness and grain dimension on the optical functions of polycrystalline silicon films

Thin Solid Films

Volumn 313-314, Issue , 1998, Pages 243-247

  Borghesi, A ^a,c   Tallarida, G ^a   Amore, G ^a   Cazzaniga, F ^b   Queirolo, G ^b   Alessandri, M ^b   Sassella, A ^c  

^a INFM   (Italy)

^b STMICROELECTRONICS   (Italy)

^c UNIVERSITY OF MILAN   (Italy)

Author keywords

Atomic force microscopy; Polycrystalline silicon; Spectroscopic ellipsometry; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SURFACE ROUGHNESS;

SPECTROSCOPIC ELLIPSOMETRY;

SEMICONDUCTING FILMS;

EID: 0031998570     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00826-2     Document Type: Article

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