Discharge and circuit simulation of a plasma cathode TEA HF laser operating with a He/SF6/C3H8 gas mixture

Optics Communications

Volumn 134, Issue 1-6, 1997, Pages 145-148

  Tsikrikas, G N ^a   Serafetinides, A A ^a  

^a NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC RESISTANCE MEASUREMENT; LASER PRODUCED PLASMAS; MATHEMATICAL MODELS; PHOTOCATHODES; PLASMA SIMULATION;

LASER DISCHARGE SIMULATION;

GAS LASERS;

EID: 0030871132     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(96)00560-3     Document Type: Article

References (6)

1. A.V. Eletskii, Sov. Phys. Usp. 24 (1981) 475.
2. G.N. Tsikrikas, A.A. Serafetinides and A.D. Papayannis, Appl. Phys. B 62 (1996) 357.
3. J.L. Lyman, Appl. Optics 12 (1973) 2736.
4. H. Brunet, M. Mabru, J. Rocca Serra and C. Vannier, SPIE 1397 (1990) 273.
5. M.G. Baeva and P.A. Atanasov, Nuovo Cimento D 17 (1995) 261.
6. PSI, Interactive Simulation Program, BOZA automatisering, The Netherlands.