Numerical simulation of chemical vapour deposition process in electric field

Computers and Chemical Engineering

Volumn 22, Issue SUPPL.1, 1998, Pages

  Rudniak, L ^a  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Chemical vapour deposition; Computational fluid dynamics; Electric field

Indexed keywords

DEPOSITION; HYDRODYNAMICS; MATHEMATICAL MODELING;

EID: 0031843559     PISSN: 00981354     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0098-1354(98)00141-0     Document Type: Article

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