Magnetron sputtering deposition of ultrathin W-Si multilayers for X rays optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1019, Issue , 1989, Pages 148-153

  Vidal, B ^a   Marfaing, J ^a   Dhez, P ^b  

^a AIX MARSEILLE UNIVERSITY   (France)

^b UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION RATES; FILM PREPARATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETIC MATERIALS; SILICON COMPOUNDS; THIN FILMS; X RAYS;

MAGNETRON-SPUTTERING DEPOSITION; MULTI-LAYERED STRUCTURE; PERIODIC LAYERS; PHYSICAL LIMITATIONS; ULTRA-THIN; ULTRATHIN LAYERS; X RAY MIRRORS; X-RAY REFLECTIVITY MEASUREMENTS;

TUNGSTEN COMPOUNDS;

EID: 85075250438     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.950030     Document Type: Conference Paper

References (8)

1. T. W. Barbee Jr, Low Energy X-ray Diag. ed. by Attwwood and B. L. Henke MP conf. Proc. no75 MP New York (1981)
2. B. Vidal, A. Fornier and E. Pelletier, App. Opt., vol 17, pp 1038-1047, (1978)
3. B. Vidal and P. Dhez S. P. I. E. proceeding vol 689, 1986
4. G. Desrousseaux and B. Vidal MRS proceeding, Strasbourg, Europe 1985.
5. Y. Lepetre, G. Rasigni, R. Rivoira and Roger Philip. J. O. SA. vol 2, pp 1356, pp 1356, 1362.
6. Y. Lepetre, E. Ziegler and I. K. Schuller. Appl. Phys. Lett, vol 50 (21) pp 1480 (1987)
7. V. Bodart, thesis, Paris VII university, (10 July 87).
8. P. Dhez, S. Megter, M. F. Ravet, E. Ziegler, S. P. I. E. proceeding, San Diego USA August 88.