SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 407-410

Electron beam lithography and ion implantation techniques for fabrication of high-Tc Josephson junctions

(7) Barth, R a Hamidi, A H a Hadam, B a Hollkott, J a Dunkmann, D a Auge, J a Kurz, H a

a UNIVERSITY HOSPITAL RWTH AACHEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL CURRENTS; ELECTRIC RESISTANCE; ELECTRON BEAM LITHOGRAPHY; HIGH TEMPERATURE SUPERCONDUCTORS; ION BOMBARDMENT; ION IMPLANTATION; MAGNETIC FIELD EFFECTS; MASKS; MICROELECTRONIC PROCESSING; SQUIDS; YTTRIUM COMPOUNDS;

APPLIED MAGNETIC FLUX; NORMAL RESISTANCE; OXYGEN ION IRRADIATION;

JOSEPHSON JUNCTION DEVICES;

EID: 0029779782 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/0167-9317(95)00274-X Document Type: Article

Times cited : (6)

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