Influence of Ar ion addition on synthesis of carbon nitride films by ion-beam-assisted deposition

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

Volumn 64, Issue 1, 1998, Pages 152-156

  Kohzaki, Masao ^a   Matsumuro, Akihito ^a   Muramatsu, Mutsuo ^a   Hayashi, Toshiyuki ^a   Yamaguchi, Katsumi ^a  

^a NONE

Author keywords

Atomic force microscopy; Bonding state; Carbon nitride film; Friction coefficient; Ion beam assisted deposition; Nano indentation hardness; Rutherford backscattering spectroscopy; Surface roughness; X ray photoelectron spectroscopy

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CARBON; CHEMICAL BONDS; COATING TECHNIQUES; FRICTION; HARDNESS; ION BOMBARDMENT; NITRIDES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE FILMS; FRICTION COEFFICIENT; ION BEAM ASSISTED DEPOSITION; NANO INDENTATION HARDNESS;

PROTECTIVE COATINGS;

EID: 0031676872     PISSN: 09120289     EISSN: None     Source Type: Journal    
DOI: 10.2493/jjspe.64.152     Document Type: Article

References (7)

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