ArF-excimer-laser annealing of 3C-SiC films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 1, 1998, Pages 94-95

  Mizunami, Toru ^a   Toyama, Naotake ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Excimer laser; Laser annealing; Laser processing; SiC

Indexed keywords

ANNEALING; BORON; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; EXCIMER LASERS; FILM GROWTH; LASER BEAM EFFECTS; MORPHOLOGY; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SILICON CARBIDE; SURFACE TREATMENT;

LASER ANNEALING;

SEMICONDUCTING FILMS;

EID: 0031675536     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.37.94     Document Type: Article

References (16)

1. K. Kurosawa, Y. Takigawa, W. Sasaki, M. Okuda, E. Fujiwara, K. Yoshida and Y. Kato: IEEE J. Quantum Electron. 27 (1991) 71.
2. K. Shibahara, S. Nishino and H. Matsunami: J. Cryst. Growth 78 (1986) 538.
3. I. Golecki, F. Reidinger and J. Marti: Appl. Phys. Lett. 60 (1992) 1703.
4. K. Takahashi, S. Nishino and J. Saraie: Appl. Phys. Lett. 61 (1992) 2081.
5. S. Y. Chou, Y. Chang, K. H. Weiner, T. W. Sigmon and J. D. Parsons: Appl. Phys. Lett. 56 (1990) 530.
6. S. Ahmed, C. J. Barbero and T. W. Sigmon: Appl. Phys. Lett. 66 (1995) 712.
7. P. E. Pehrsson and R. Kaplan: J. Mater. Res. 4 (1989) 1480.
8. S. P. Lau, J. M. Marshall, T. E. Dyer, A. R. Hepburn and J. F. Davies: Mater. Res. Soc. Symp. Proc. 339 (1994) 647.
9. S. P. Lau, J. M. Marshall and L. R. Tessler: J. Non-Cryst. Solids 198-200 (1996) 907.
10. K. Choi, Y. Uchida and M. Matsumura: Jpn. J. Appl. Phys. 35 (1996) 1648.
11. W. J. Choyke and L. Patrick: Phys. Rev. 187 (1969) 1041.
12. Y. Li and P. J. Lin-Chung: Phys. Rev. B 36 (1987) 1130.
13. J. A. Van Vechten and M. Wautelet: Phys. Rev. B 23 (1981) 5543 and 5551.
14. T. Uemura, T. Omoto, K. Kitahara, T. Mizunami and N. Toyama: Bull. Kyushu Inst. Technol. (1990) No. 61, 27 [in Japanese].
15. T. Mizunami, N. Toyama and T. Sakaguchi: J. Appl. Phys. 78 (1995) 3525.
16. R. Sakuma, I. Sunohara, M. Sakamoto and N. Toyama: Rec. Joint Conf. Electrical and Electronics Engineers in Kyushu, Naha, 1997, p. 573 [in Japanese].