Photoemission study of the desorption and reaction of C 60 and K 4 C 60 films on Si(111) surfaces

Applied Surface Science

Volumn 133, Issue 1-2, 1998, Pages 103-107

  Wu, J X ^a   Liu, X M ^a   Ma, M S ^a   Yang, H W ^a   Cai, W W ^a   Ji, M R ^a   Zhu, J S ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

C 60; Desorption; K 4 C 60; Photoemission; Reaction; Si(111) surfaces

Indexed keywords

DESORPTION; FULLERENES; MULTILAYERS; PHOTOEMISSION; POTASSIUM COMPOUNDS; SEMICONDUCTING SILICON; SILICON ALLOYS; SILICON CARBIDE; SURFACE STRUCTURE; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 0031673370     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00183-4     Document Type: Article

References (17)

1. H. Morkoç, S. Strite, G.B. Gao, M.E. Lin, B. Sverdlov, M. Burns, J. Appl. Phys. 76 (1994) 1363.
2. A.V. Hamza, M. Balooch, M. Moalem, Surf. Sci. 317 (1994) L1129.
3. C.-W. Hu, A. Kasuya, S. Suto, A. Wawro, Y. Nishina, Appl. Phys. Lett. 68 (1996) 1253.
4. D. Chen, D. Sarid, Phys. Rev. B 49 (1994) 7612.
5. X.-D. Wang, T. Hashizume, H. Shinohara, Y. Saito, Y. Nishina, T. Sakurai, Phys. Rev. B 47 (1993) 15923.
6. P. Soukiassian, T.M. Gentle, M.H. Bakshi, Z. Hurych, J. Appl. Phys. 60 (1986) 4330.
7. P. Soukiassian, M.H. Bakshi, H.I. Starnberg, Z. Hurych, Phys. Rev. Lett. 59 (1887) 1488.
8. R.C. Haddon, A.F. Hebard, M.J. Rosseinsky, D.W. Murphy, S.J. Duclos, K.B. Lyons, B. Miller, J.M. Rosamilia, R.M. Fleming, A.R. Kortan, S.H. Glarum, A.V. Makhija, A.J. Miller, R.H. Eick, S.M. Zahurak, R. Tycko, G. Dabbagh, F.A. Theil, Nature 350 (1991) 320.
9. D.M. Poirier, T.R. Ohno, G.H. Kroll, Y. Chen, P.J. Benning, J.H. Weaver, L.P.F. Chibante, R.E. Smalley, Science 253 (1991) 646.
10. C.T. Chen, L.H. Tjeng, P. Rudolf, G. Meigs, J.E. Rowe, J. Chen, J.P. McCauley Jr, A.B. Smith III, A.R. McGhie, W.J. Romanow, E.W. Plummer, Nature 352 (1991) 603.
11. R.M. Fleming, M.J. Rosseinsky, A.P. Ramirez, D.W. Murphy, J.C. Tully, R.C. Haddon, T. Siegrist, R. Tycko, S.H. Glarum, P. Marsh, G. Dabbagh, S.M. Zahurak, A.V. Makhija, C. Hampton, Nature 352 (1991) 701.
12. J.H. Scofield, J. Electron Spectrosc. Rel. Phen. 8 (1976) 129.
13. D.N. Belton, S.J. Harris, S.J. Schmieg, A.M. Weiner, T.A. Perry, Appl. Phys. Lett. 54 (1989) 416.
14. B.R. Stoner, G.-H.M. Ma, S.D. Wolter, J.T. Glass, Phys. Rev. B 45 (1992) 11067.
15. F. Bozso, J.T. Yates Jr., W.J. Choyke, L. Muehlhoff, J. Appl. Phys. 57 (1985) 2771.
16. M.R. Ji, J.S. Zhu, M.S. Ma, J.X. Wu, X.M. Liu, B.K. Jin, B.F. Yang, P.S. He, Y.Z. Ruan, J. Appl. Phys. 80 (1996) 2471.
17. V.M. Bermudez, J.P. Long, Appl. Phys. Lett. 66 (1995) 475.