Nanostructuring high resolution phase zone plates in nickel and germanium using cross-linked polymers

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 513-516

  Schliche, T ^a   Schneider, G ^a   Aschoff, H ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRODEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; GERMANIUM; MASKS; NANOSTRUCTURED MATERIALS; NICKEL; PHOTORESISTS; POLYMERS; REACTIVE ION ETCHING;

CROSSLINKED POLYMERS; ELECTRON BEAM RESIST; ETCHING MASK; HIGH RESOLUTION PHASE ZONE PLATES; LINEWIDTHS; PATTERN TRANSFER;

MICROELECTRONIC PROCESSING;

EID: 0029774326     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00298-7     Document Type: Article

References (7)

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4. C. David et al., J. Vac. Sci. Technol. B, Nov./Dez. 1995
5. o 6, pp. 255-258, 1992
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