Growth and morphology of Ni films on Cu (111)

Surface Science

Volumn 395, Issue 2-3, 1998, Pages 168-181

  Wulfhekel, Wulf ^a   Beckmann, Ingo ^a   Rosenfeld, Georg ^a   Poelsema, Bene ^b   Comsa, George ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Atom solid scattering and diffraction Elastic; Copper; Growth; Low energy electron diffraction (LEED); Nickel; Single crystal epitaxy

Indexed keywords

ANNEALING; COPPER; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; FILM GROWTH; ION BEAMS; MOLECULAR BEAM EPITAXY; MORPHOLOGY; NICKEL; NUCLEATION; SINGLE CRYSTALS; THERMAL EFFECTS;

ATOM SOLID SCATTERING; ION BEAM ASSISTED DEPOSITION;

METALLIC FILMS;

EID: 0031652067     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00622-5     Document Type: Article

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