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Volumn 35, Issue 2, 1998, Pages 83-96

Determination of the von Klitzing constant and the fine-structure constant through a comparison of the quantized Hall resistance and the ohm derived from the NIST calculable capacitor

Author keywords

[No Author keywords available]

Indexed keywords

FINE STRUCTURE CONSTANT; KLITZING CONSTANT;

EID: 0031650383     PISSN: 00261394     EISSN: None     Source Type: Journal    
DOI: 10.1088/0026-1394/35/2/3     Document Type: Review
Times cited : (60)

References (40)
  • 7
  • 9
  • 19
    • 0003491213 scopus 로고
    • Master's Thesis, School of Engineering and Applied Science, George Washington University, Washington DC
    • 5 rad/s, Master's Thesis, School of Engineering and Applied Science, George Washington University, Washington DC, 1969, 1-57.
    • (1969) 5 Rad/s , pp. 1-57
    • Haddad, R.J.1
  • 27
    • 0345990279 scopus 로고
    • Guidelines for Implementing the New Representations of the Volt and Ohm Effective January 1, 1990
    • Belecki N., Dziuba R. F., Field B. F., Taylor B. N., Guidelines for Implementing the New Representations of the Volt and Ohm Effective January 1, 1990, NIST Technical Note 1263, 1989.
    • (1989) NIST Technical Note 1263
    • Belecki, N.1    Dziuba, R.F.2    Field, B.F.3    Taylor, B.N.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.