The modeling of resistance changes in the early phase of electromigration

Microelectronics Reliability

Volumn 38, Issue 1, 1998, Pages 99-105

  Mouthaan, Ton J ^a   Petrescu, Violeta ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALLOYS; CURRENT DENSITY; ELECTRIC CURRENTS; ELECTRIC RESISTANCE MEASUREMENT; GRAIN BOUNDARIES; MATHEMATICAL MODELS; METALLIZING;

METALLIZATION STRIPES;

ELECTROMIGRATION;

EID: 0031633701     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(97)00066-8     Document Type: Article

References (22)

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