RF-Sputter Deposition of Si-Fe-N Ternary Thin Films and Their Thermal Annealing for Granular Magnetic Films

Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy

Volumn 45, Issue 1, 1998, Pages 63-67

  Kikkawa, Shinichi ^a   Sugiyama, Hideyuki ^a   Takahashi, Masao ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Amorphous; Cosputter; Granular; Local structure; Magnetizm; Reaction sputter

Indexed keywords

AMORPHOUS FILMS; ANNEALING; FERROMAGNETISM; GRANULAR MATERIALS; IRON COMPOUNDS; MAGNETIC FILMS; PARTICLES (PARTICULATE MATTER); PRECIPITATION (CHEMICAL); PYROLYSIS; SILICON COMPOUNDS; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY;

GRANULAR MAGNETIC FILM; REACTION COSPUTTERING; TERNARY THIN FILM;

THIN FILMS;

EID: 0031632213     PISSN: 05328799     EISSN: None     Source Type: Journal    
DOI: 10.2497/jjspm.45.63     Document Type: Article

References (13)

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