Formation of iron nitrides applying N+ ion implantation

Vacuum

Volumn 47, Issue 6-8, 1996, Pages 863-866

  Kikkawa, S ^a   Sugiyama, H ^a   Ohmura, T ^a   Kanamaru, F ^a   Hinomura, T ^a   Nasu, S ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Fe16N2; Ion implantation; Iron nitrides; M ssbauer; X ray diffraction

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; ION BEAMS; ION IMPLANTATION; MOSSBAUER SPECTROSCOPY; NITRIDES; NITROGEN; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; THIN FILMS; X RAY CRYSTALLOGRAPHY; X RAY POWDER DIFFRACTION;

GLANCING ANGLE METHODS; HIGH ENERGY IMPLANTATION; ION NITRIDES; THERMAL INSTABILITY; X RAY BEAM ANGLE;

IRON COMPOUNDS;

EID: 0030173635     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0042-207x(96)00083-8     Document Type: Article

References (7)

1. S Kikkawa, T Yamamoto, K Ohta, M Takahashi and F Kanamaru, In The Chemistry of Transition Metal Carbides and Nitrides, S T Oyama (Ed.). Chapman and Hall (1995) p 175.
2. T K Kim and M Takahashi, Appl Phys Lett, 20, 492 (1972).
3. K H Jack, Proc Soc Lond, A208, 216 (1951).
4. Y Sugita, H Takahashi, M Komuro, K Mitsuoka and A Sakuma, J Appl Phys, 76, 6637 (1994).
5. K Nakajima and S Okamoto, Appl Phys Lett, 56, 92 (1990).
6. M Takahashi, H Shoji, H Takahashi, H Nishi, T Wakiyama, M Doi and M Matsui, J Appl Phys, 76, 6642 (1994).
7. M. Ron, In Application of Mössbauer Spectroscopy, Vol. 2, R L Cohen (Ed). Academic Press, New York (1980) p 380.