De la nécessité d'une fine couche de nickel pour obtenir des couches minces de MoSe2 photoconductrices

EPJ Applied Physics

Volumn 3, Issue 2, 1998, Pages 135-139

  Ouerfelli, J ^a   Jlaiel Z ^a   Guettari, N ^b   Gourmelon, E ^a   Pouzet, J ^a   Bernede, J C ^a   Khelil, A ^b   Zoater, M ^c   Conan, A ^a  

^a Grp Couches Minces et Mat Nouveaux   (France)

^b UNIVERSITY OF ORAN   (Algeria)

^c LEBANESE UNIVERSITY   (Lebanon)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CONDUCTIVE FILMS; ELECTRONIC STRUCTURE; INTERFACES (MATERIALS); METALLIC SUPERLATTICES; MOLYBDENUM ALLOYS; NICKEL; PHOTOCURRENTS; THIN FILMS;

MOLYBDENUM DISELENIDE;

PHOTOCONDUCTING MATERIALS;

EID: 0031624431     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:1998215     Document Type: Article

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