Characteristics of a pulsed DC-glow discharge CVD reactor for deposition of thick diamond films

International Journal of Refractory Metals and Hard Materials

Volumn 16, Issue 3, 1998, Pages 207-216

  Hartmann, P ^a   Haubner, R ^a   Lux, B ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; GLOW DISCHARGES; MOLYBDENUM; POLYCRYSTALLINE MATERIALS; SUBSTRATES; THICK FILMS; X RAY DIFFRACTION ANALYSIS;

METALLIC SUBSTRATES;

DIAMOND FILMS;

EID: 0031619362     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0263-4368(98)00020-1     Document Type: Article

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