Formation of buried p-type conducting layers in diamond

Applied Physics Letters

Volumn 71, Issue 11, 1997, Pages 1492-1494

  Walker, R ^a   Prawer, S ^a   Jamieson, D N ^a   Nugent, K W ^a   Kalish, R ^b  

^a UNIVERSITY OF MELBOURNE   (Australia)

^b TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHY; CURRENT VOLTAGE CHARACTERISTICS; GRAPHITIZATION; ION IMPLANTATION; LASER PULSES; NEODYMIUM LASERS; OPTICAL MICROSCOPY; PULSED LASER APPLICATIONS; PYROMETERS; SEMICONDUCTING BORON; SEMICONDUCTING DIAMONDS; SINGLE CRYSTALS;

HIGH ENERGY ION IMPLANTATION; LASER IRRADIATION PROCESS; OPTICAL PYROMETERS; PULSED FOCUSED LASER IRRADIATION;

CONDUCTIVE FILMS;

EID: 0031572074     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119946     Document Type: Article

References (12)

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