Dynamics of SiO desorption in reactive scattering of O2 with a silicon surface

Journal of Chemical Physics

Volumn 104, Issue 9, 1996, Pages 3403-3404

  Nakamura, Kazutaka G ^a   Kamioka, Isao ^a,b   Kitajima, Masahiro ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0348128136     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.471046     Document Type: Article

References (10)

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