Development of technological sources of gas ions on the basis of hollow-cathode glow discharges

Surface and Coatings Technology

Volumn 96, Issue 1, 1997, Pages 81-88

  Gavrilov, N V ^a   Mesyats, G A ^a   Radkovski, G V ^a   Bersenev, V V ^a  

^a INSTITUTE OF ELECTROPHYSICS   (Russian Federation)

Author keywords

Broad ion beam; Discharge; Gas ion beam source; Hollow cathode glow; Ion implantation

Indexed keywords

ANODES; CATHODES; COMPOSITION; ELECTRODES; ENERGY EFFICIENCY; GLOW DISCHARGES; ION BEAMS; ION IMPLANTATION; MAGNETIC FIELDS; PHYSICAL PROPERTIES; PLASMAS; SPUTTERING;

BROAD ION BEAM; ELECTRODE STRUCTURE; HOLLOW CATHODE GLOW; INVERTED MAGNETRON TYPE ELECTRODE SYSTEM; ION EMISSION PROPERTY; ION EXTRACTION; PLASMATRON TYPE ELECTRODE SYSTEM;

ION SOURCES;

EID: 0031551621     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00096-0     Document Type: Article

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