New broad beam gas ion source for industrial application

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 1050-1055

  Gavrilov, N V ^a   Mesyats, G A ^a   Nikulin, S P ^a   Radkovskii, G V ^a   Elkind, Alexander ^b   Perry, Anthony J ^b   Treglio, James R ^b  

^a INSTITUTE OF ELECTROPHYSICS   (Russian Federation)

^b ISM Technologies Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001510630     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580132     Document Type: Article

References (16)

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