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Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 321-328

Electron emission microscopy on Au/Si and silicide/Si Schottky barriers

(3) Manke, C a Bodschwinna, Y a Schulz, M a

a UNIVERSITY OF ERLANGEN NUREMBERG (Germany)

Author keywords

Au Si; BEEM; Schottky barrier height

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION IN SOLIDS; ELECTRON BEAMS; ELECTRON EMISSION; ELECTRON MICROSCOPY; ELECTRON REFLECTION; ELECTRON SCATTERING; SCANNING TUNNELING MICROSCOPY; SCHOTTKY BARRIER DIODES; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; ULTRATHIN FILMS;

BALLISTIC ELECTRON EMISSION MICROSCOPY (BEEM); SCHOTTKY BARRIER HEIGHT (SBH);

METALLIC FILMS;

EID: 0031548246 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)80102-X Document Type: Article

Times cited : (17)

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