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Volumn 127-128, Issue , 1997, Pages 369-374

Synthesis of silicon oxynitride by ion beam sputtering and the effects of nitrogen ion-assisted bombardment

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; ION BOMBARDMENT; LIGHT ABSORPTION; MOLECULAR VIBRATIONS; NITROGEN; OXYGEN; PRESSURE EFFECTS; REFRACTIVE INDEX; SPUTTER DEPOSITION; SYNTHESIS (CHEMICAL); THIN FILMS;

EID: 0031547715     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00959-7     Document Type: Article
Times cited : (8)

References (19)
  • 2
    • 30244480293 scopus 로고
    • Plasma properties, deposition and etching
    • eds. J.J. Pouch and S.A. Alterovitz, Trans Tech Publications, Aedermannsdorf, Switzerland
    • J. Vuillod, in: Plasma Properties, Deposition and Etching, eds. J.J. Pouch and S.A. Alterovitz, Vols. 140-142 of Materials Science Forum (Trans Tech Publications, Aedermannsdorf, Switzerland, 1993) p. 301.
    • (1993) Vols. 140-142 of Materials Science Forum , vol.140-142 , pp. 301
    • Vuillod, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.