Aluminum nitride thin films grown by plasma-assisted pulsed laser deposition

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 57-60

  Ogawa, Tetsuya ^a   Okamoto, Mitsuo ^a   Mori, Yusuke ^a   Sasaki, Takatomo ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODOLUMINESCENCE; DEPOSITION; NITROGEN; PLASMA APPLICATIONS; PULSED LASER APPLICATIONS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING SILICON; SINTERING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ALUMINUM NITRIDE; PULSED LASER DEPOSITION;

FILM GROWTH;

EID: 0031547259     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00827-6     Document Type: Article

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