Deposition of Ni-TiN nano-composite films by cathodic arc ion-plating

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 121, Issue 1-4, 1997, Pages 133-136

  Irie, M ^a   Ohara, H ^a   Nakayama, A ^a   Kitagawa, N ^a   Nomura, T ^a  

^a SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRIC ARCS; NICKEL; SCANNING ELECTRON MICROSCOPY; THICK FILMS; TITANIUM COMPOUNDS; X RAY ANALYSIS;

ION-PLATING; NANO-COMPOSITE FILMS;

SPUTTER DEPOSITION;

EID: 0031546254     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00543-5     Document Type: Article

References (5)

1. K. Niihara et al., Proc. MRS Intern. Meeting on Advanced Materials, 5 (1989) pp. 107.
2. K. Nihara et al., Proc. MRS Intern. Meeting on Advanced Materials, 5 (1989) pp. 129.
3. W.W. Milligan, S.A. Hackney, M. Ke and E.C. Aifantis, Nanostruct. Mater. 2 (1993) 267.
4. A. Ishida, K. Ogawa, T. Kimura and A. Takei, Thin Solid Films 191 (1990) 69.
5. S. Yamamoto and H. Ichimura, J. Mater. Res. 11 (1996) 1149.