Reactive magnetron sputtering of silicon to produce silicon oxide

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 121, Issue 1-4, 1997, Pages 90-95

  Howson, R P ^a   Danson, N ^a   Hall, G W ^a  

^a LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; FILM GROWTH; ION BOMBARDMENT; MAGNETRONS; SILICON; THIN FILMS;

ARGON IONS; SILICON OXIDE FILMS;

MAGNETRON SPUTTERING;

EID: 0031546206     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00378-3     Document Type: Article

References (12)

1. J. Ebert, Surface Technology and Coatings 43/44 (1990) 950.
2. H.K. Pulker, J. Vac. Sci. Technol. A 10 (1992) 1669.
3. S. Pongratz and A. Zoller, J. Vac. Sci. Technol. A 10 (1992) 1897.
4. R.P. Howson and H.A. Ja'fer, J. Vac. Sci. Technol. A 10 (1992) 1784.
5. R.P. Howson, Pure and Applied Chem. 66 (1994) 1311.
6. S. Schiller, G. Beister and W. Sieber, Thin Solid Films, 111 (1984) 259.
7. A.G. Spencer and R.P. Howson, Thin Solid Films 186 (1990) 129.
8. S. Schiller, U. Heisig, K. Steinfelder, J. Strumpfel, A. Friedrich and R. Fricke, Proc. IPAT '87 (1987) 23.
9. H. Czternastek, A. Brudnik, M. Jachimowski and E. Kolawa, J. Phys. D 25 (1992) 865.
10. R.P. Howson, Synthesis of optical thin films: Fundamentals and applications, in: Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Fundamentals and Applications, NATO/ASI Series E, eds. O. Auciello and J. Englemann (Kluwer, Dordrecht, 1993).
11. M. Scherer, J. Schmitt, R. Latz and M. Schanz, J. Vac. Sci. Technol. A 10 (1992) 1772.
12. R.P. Howson, these Proceedings, Nucl. Instr. and Meth. B 121 (1997) 65.