Plasma etching of III-V semiconductors in BCl3 chemistries: Part I: GaAs and related compounds

Plasma Chemistry and Plasma Processing

Volumn 17, Issue 2, 1997, Pages 155-167

  Lee, J W ^a   Hong, J ^a   Lambers, E S ^a   Abernathy, C R ^a   Pearton, S J ^a   Hobson, W S ^b   Ren, F ^b  

^a UNIVERSITY OF FLORIDA   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

ECR plasmas; High ion densities; Plasma etching; Surface morphologies

Indexed keywords

EID: 0031526909     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02766812     Document Type: Article

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