Effect of H2 concentration on r.f plasma-enhanced chemical vapour deposition of boron nitride coatings from the BCl3-N2-H2-Ar gas system

Surface and Coatings Technology

Volumn 80, Issue 1-2, 1996, Pages 13-17

  Schaffnit, C ^a   Del Puppo, H ^a   Hugon, R ^a   Thomas, L ^a   Moretto, P ^a   Rossi, F ^a   Pauleau, Y ^b  

^a JOINT RESEARCH CENTRE   (Italy)

^b GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

Author keywords

Boron nitride; Film characterization; Hydrogen content; PECVD; Plasma diagnostics

Indexed keywords

BORON NITRIDE; COATINGS; VAPOUR DEPOSITION;

BORON COMPOUNDS; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; CHLORINE; COMPOSITION EFFECTS; HYDROGEN; MIXTURES; MORPHOLOGY; OXYGEN; PHASE COMPOSITION; PLASMA APPLICATIONS; PLASMA DIAGNOSTICS;

BORON NITRIDE; FILM CHARACTERIZATION; GAS MIXTURE; GAS PHASE ANALYSIS; HYDROGEN CONTENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CERAMIC COATINGS;

EID: 0029675045     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02678-9     Document Type: Article

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