Development of X-ray mask fabrication process using W-sputtering

Metals and Materials International

Volumn 3, Issue 4, 1997, Pages 272-276

  Lee, Taeho ^a   Lee, Seungyoon ^a   Ahn, Jinho ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; MASKS; SPUTTERING; TENSILE STRESS;

AMORPHOUS STRUCTURES; DC MAGNETRON SPUTTERS; OPTIMUM PROCESS CONDITIONS; SPUTTERING CONDITIONS; SPUTTERING PRESSURES; STRESS STABILITY; SURFACE SMOOTHNESS; SURFACE-ROUGHENING;

X RAYS;

EID: 0031474984     PISSN: 12259438     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF03025935     Document Type: Article

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