Thin films of amorphous silicon-tin alloy prepared by radio-frequency magnetron sputtering

Journal of the Electrochemical Society

Volumn 144, Issue 12, 1997, Pages 4350-4353

  Maruyama, Toshiro ^a,b   Akagi, Hisao ^a  

^a KYOTO UNIVERSITY   (Japan)

^b ELECTROCHEMICAL SOCIETY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; AMORPHOUS FILMS; ANNEALING; MAGNETRON SPUTTERING; SILICON ALLOYS; X RAY DIFFRACTION;

PSEUDOOPTICAL ENERGY GAP; SILICON TIN ALLOY;

THIN FILMS;

EID: 0031383844     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838191     Document Type: Article

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