Dynamical simulation of sputtering and reflection from a ternary alloy

Radiation Effects and Defects in Solids

Volumn 142, Issue 1-4, 1997, Pages 287-299

  Ishida, M ^a   Yamaguchi, Y ^a   Yoshinaga, H ^a   Yamamura, Y ^b  

^a MITSUBISHI CHEMICAL CORPORATION   (Japan)

^b OKAYAMA UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Dynamical Monte Carlo simulation; Magneto optical film; Magnetron sputtering deposition; Radiation induced segregation; Ternary alloy sputtering

Indexed keywords

ARGON; COMPUTER SIMULATION; ION BOMBARDMENT; MAGNETIC FILMS; MAGNETRON SPUTTERING; MONTE CARLO METHODS; OPTICAL FILMS; RADIATION EFFECTS; SEGREGATION (METALLOGRAPHY); SPUTTER DEPOSITION; TERNARY SYSTEMS;

MAGNETOOPTICAL FILM; MAGNETRON SPUTTERING DEPOSITION; SOFTWARE PACKAGE ACAT DIFFUSE; TERNARY ALLOY SPUTTERING;

TERBIUM ALLOYS;

EID: 0031381238     PISSN: 10420150     EISSN: None     Source Type: Journal    
DOI: 10.1080/10420159708211614     Document Type: Article

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